SAN JOSE, Calif. — Actinix Inc. has been awarded a Phase II grant from the National Science Foundation (NSF) to complete the development of its phase-shift metrology system for advanced photomasks ...
At the 20nm process node and below, attenuated phase shift masks (PSM) are used in the photolithography process, which results in approximately 70nm of topography. This now must be accounted for using ...
Austin, Texas – Intel Corp. said it used its 65-nanometer process to make fully functional 4-Mbit test SRAMs, in essence launching the next go-round in the process technology-scaling competition among ...
Experts at the Table: Semiconductor Engineering sat down to discuss optical and EUV photomasks issues, as well as the challenges facing the mask business, with Naoya Hayashi, research fellow at DNP; ...
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