Electron Beam Lithography (EBL) is a specialized technique for creating the extremely fine patterns required by the modern electronics industry for integrated circuits. This is possible due to the ...

If you would like to learn more about the IAEA’s work, sign up for our weekly updates containing our most important news, multimedia and more. Beams of accelerated electrons can do wonders to improve ...

Proton beam writing (PBW) and ion beam applications represent a cutting‐edge suite of techniques for material patterning and modification at the micro‐ and nanoscale. PBW utilises focussed MeV proton ...