Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...
SAN FRANCISCO — Amid probable delays for extreme ultraviolet (EUV) lithography, ASML, Canon and Nikon are updating their roadmaps, racing each other to capitalize on the shift towards ...
Double patterning looks like being the lithography tool of choice at 32nm, but how do you absorb the inevitable extra costs of a double lithography process? According to Applied Materials, the world’s ...
According to Applied Materials, it is. As 32 nm technologies ramp within the next two years, the extension of optical lithography to meet patterning requirements is the industry’s most urgent ...
TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through. Share on Facebook (opens in a new window) Share on X (opens in ...
Cadence Design Systems is targeting designs for the 20nm process node with its latest tools in the Virtuoso suite. Called Virtuoso Advanced Node, the mixed signal chip design tool addresses 20nm ...
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