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This is a preview. Log in through your library . Abstract The backbone conformation of conjugated polymers affects, to a large extent, their optical and electronic properties. The usually flexible ...
The U.S. Chemical Mechanical Planarization market was valued at USD 1.79 billion in 2025 and is projected to reach USD 3.09 billion by 2035, growing at a CAGR of 5.63%. Growth is driven by rising ...
SANTA CLARA, Calif.--(BUSINESS WIRE)--July 12, 2004--Applied Materials, Inc. (Nasdaq:AMAT) today announces a major breakthrough in planarization technology with its revolutionary 300mm Applied ...
In semiconductor manufacturing, a process called chemical mechanical planarization (CMP) is used for polishing wafer surfaces. CMP uses a slurry that contains both functional chemicals and ...
ChEmpower Corp., a semiconductor materials company that develops polishing pads and chemical solutions, today announced Chakra, its first product designed to improve efficiency, reduce costs and ...
Purpose-built for next-generation semiconductor manufacturing, AI chips, HBM, and advanced packaging Today, ChEmpower, a leader in semiconductor process innovation, announced Chakra™, a family of ...
Scientists have achieved the first real-time visualization of how "excited-state aromaticity" emerges within just hundreds of femtoseconds and then triggers a molecule to change from bent to planar ...
COLONIE — Colonie-based SMART Pad, which has developed a polishing pad for use in semiconductor manufacturing at the sub-7 nanometer mode, will make a presentation on its technology at the upcoming ...
In the past decade, chemical-mechanical polishing (CMP) has emerged as the predominant planarization technique for shallow trench isolation (STI) and back end of the line (BEOL) metallization. To ...
PORTLAND, Ore.--(BUSINESS WIRE)--Today, ChEmpower, a leader in semiconductor process innovation, announced Chakra™, a family of functional polishing pads, beginning with the Copper Series, designed ...